High Density Plasma Sources. Design, Physics and Performance by Oleg A. Popov

By Oleg A. Popov

Content material:
Preface

, Pages vii-xii, Oleg A. Popov
Contributors

, Pages xiii-xiv
1 - Helicon Plasma Sources

, Pages 1-75, Francis F. Chen
2 - Planar Inductive Sources

, Pages 76-99, John C. Forster, John H. Keller
3 - Electrostatically-Shielded Inductively-Coupled RF Plasma Sources

, Pages 100-148, Wayne L. Johnson
4 - Very excessive Frequency Capacitive Plasma Sources

, Pages 149-190, Michael J. Colgan, M. Meyyappan
5 - floor Wave Plasma Sources

, Pages 191-250, Michel Moisan, Joëlle Margot, Zenon Zakrzewski
6 - Microwave Plasma Disk Processing Machines

, Pages 251-311, Jes Asmussen
7 - Electron Cyclotron Resonance Plasma Sources

, Pages 312-379, James E. Stevens
8 - dispensed ECR Plasma Sources

, Pages 380-425, Jacques Pelletier
Index

, Pages 426-445

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__ -- <; r-, ---~ " ..... 2 Ao- •. 067 L;] z ......... :;..... ~ . -; .... ..... _- .. <, ~ 0 ..... _. 8 rI a -.. 8 ~ c: '---. 6 ........ 53-4 I'\.. 2 ~ al 0 ,>............ 2 ... 4 --Bz <, ....... ·jBr <, ... _ .. _. ·Bth -..... ~.. : ? p....... ....... .......... 6 o L;] m 0, p rabalip - .. , " <.. """" .. -... ::, --- - ... _-- -- .. '. '. -- .. • ;-- ' .... ~ --, ...... ,. ... / " al ... 20 .. 112 b;J --Bz ....... 8 rI a Figure 14. Computed profiles for Bz,Br, andB{lforthem = 0, +1, and-l modes in uniform and parabolic density distributions.

Jo (i - i 0)&0£) To simplify the problem, we neglect damping (v= '7 =0), so that the curl of Eq 6 becomes 0 Eqo (43) V' x E = V' x (j x B o) en o We now let no be a function of r, so that a, as defined by Eq. 13, is also a function of r: 24 High Density Plasma Sources Eq. (44) We next substitute Eq. 43 into Eq. 20, noting that no is no longer constant in Eq. 43. Using Eq. 44, one obtains Eq. (45) where we have written a'/afor nd/no. We see thatB1 still satisfies Eq. 24, but there are two added terms in Bz .

0 -25 en r 0 z, -50 : i 1 I----j-----t------+--- , Q) Ol '" ~ -75 > Ol c ~ -100 0 rr ·125 i - ·- - , ~~~~I~f~I~~~r~~~·~··~·;~~;i, ·150 o 40 80 120 160 B (gauss) Figure 30. Floating potential of an endplate vs. l 32 ] 200 Helicon Plasma Sources 43 Control ofthe electron f(v) by varying the phase velocity ark has been demonstrated by Shoji et aLl80] in an argon/Cl-I, plasma. Figure 32 shows the energy distribution measured by a velocity analyzer as a function of RF frequency for constant antenna length.

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